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80% throwing power and no corner flattening at 2.5 A/dm², AR 8:1 BMV with >80% throwing power at 2.2 A/dm² atotech.com Global head office Atotech Group +49 30 349850 info@atotech.com Cupracid ® TP3 Convincing processing advantages Advanced solu on for conformal copper pla ng in ver cal hoist type systems Excellent compatibility with direct plating Cupracid ® TP3 provides excellent throwing power and minimum corner flattening over high working range. By this outstanding throwing power even at high current densities less copper needs to be plated on the surface, enabling higher productivity for conventional hoist type equipment. The plated deposits with Cupracid ® TP3 exhibit uniform crystal structure resulting in excellent ductility and tensile stress. The anode film created by use of Cupracid ® TP3 is very robust and therefore ensures stable production conditions and additive consumption.