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OCTOBER 2022 I PCB007 MAGAZINE 21 • Maskless Lithography's DMD-based system (USA), using a mercury arc light source or LEDs • Aiscent Technologies (Canada) e Korean company Ajuhitek, Inc., entered the market with its EP digital imager series using a laser diode radiation source with the wavelength of 405 nm. To the best of my knowledge, HAN's Laser Technology Group is the only Chinese sup- plier of direct imagers. Japanese direct imager suppliers ADTEC, DNS, ORC, and Via Mechanics continue to introduce improved systems. e Swiss supplier PrintProcess introduced its Apollon DI-F10 (manual single frontload) and the Apollon-DI-A11 (auto double-side reverse inline). Line width resolution is 30 to 20 microns depending on photoresist type. ere are one to seven imaging heads (eight is optional). e light source is UV-LED, with multiple wavelengths in the range of 360 to 420 nm. ese units offer automated loading and unloading. It offers automatic image scaling and reliably resolves 1-mil features. KLEO Halbleitertechnik GmbH, Germany, supplies direct imagers since 2009, with sys- tems in production in Germany and Switzer- land. e KLEO-LDI-System CB20HV-Twin- stage uses a 405 nm wavelength laser diode. e 405 nm radiation source is dominant in Asia. Photoresists (dry film and liquid) suit- able of exposure at 405 nm are available from Hitachi, DuPont, Atotech, Eternal, Kolon, and Elga Europe. KLEO was acquired by Manz in 2015. e UV-P100 UV-LED direct imager by Limata GmbH (Germany) was developed for prototype and short run production. It can use conventional dry film and solder mask. Light source life exceeds 10,000 hours. Maxi- mum panel size is 650 x 540 mm. Resolution of 50-micron features is obtained. Automated load/unload is available, and side-to-side reg- istration is achieved with cameras and registra- tion target holes. Orbotech has installed over 1,000 direct imagers. Its Nuvogo DI System is designed for mass produc- tion of advanced HDI/flex and rigid flex applications, accord- ing to Orbotech. e Nuvogo 800 is compatible with nearly all resist types. Its resolution is capable of 18-micron lines and spaces. Nuvogo makes use of Orbotech's well established large- scan-optics-technology (LSO). e MultiWave Laser Technol- ogy uses a multi-wavelength laser beam of high intensity so that lower cost resist with standard photosensitivity can be used for high throughput (up to 7,000 pan- els/day/line) with optimal line structure. Manz, a supplier of wet process- ing chemistry modules, has diver- sified into digital imaging with its Figure 2: The UV light is directed through the DLP/DMDs down onto the panel surface 4 .