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66 The PCB Magazine • November 2015 mirrors are addressed with an electric pulse so that the mirror is either tilted to direct the light to the substrate or away from the substrate. Or, in the case of ink jetting, it could be a piezo- electric membrane that changes its shape upon receiving an electrical pulse, thus causing the formation of an ink droplet, or it could be a dig- itally modulated electrical field that selectively deviates electrically charged ink droplets from a continuous stream of droplets. More recently, additional developmental and commercial digital imaging systems have been marketed. The French supplier of imaging systems, Altix-Automata-Tech, first introduced its ADIX- System at productronica 2013. It is based on an advanced high-power LED radiation source (ALDS), a dual multi-wavelength UV-LED, and DMDs. The system is suitable for rigid and flex substrates and has automatic handling options. Earlier systems using DMDs include: • ORC's DI-Impact (formerly by Pentax) • Hitachi's DE imagers DE-H, DE-S, and DE-F series • MIVA Technologies GmbH, Germany, Miva 2600X Direct Imager • Maskless Lithography's DMD-based system (USA), using a mercury arc light source • Aiscent Technologies Inc. (Canada) The Korean company AJUHITEK entered the market with its EP digital imager series that is using a laser diode radiation source with the wavelength of 405 nm. HAN's Laser is the only Chinese supplier of direct imagers to the best of my knowledge. The Japanese direct imager suppliers ADTEC, DNS, ORC and Via Mechanics continue to in- troduce improved systems. The Swiss supplier PrintProcess introduced its Apollon DI-A11 direct imager that offers au- tomated loading and unloading. It offers auto- matic image scaling and resolves reliably 1 mil features. KLEO Halbleitertechnik GmbH, Germany, has supplied direct imagers since 2009, with systems in production in Germany and Switzerland. The KLEO-LDI-System CB20HV- Twinstage uses a 405 nm wavelength laser di- ode. The 405 nm radiation source is dominant in Asia. Photoresists (dry film and liquid) suit- able of exposure at 405 nm are available from Hitachi, DuPont, Atotech, Eternal, Kolon and Elga Europe. The UV-P100 UV-LED direct imager by Li- mata GmbH (Germany) was developed for pro- totype and short run production. It can use con- ventional dry film and soldermask. Light source life exceeds10,000 hours. Max panel size is 650 x 540 mm 2 . Resolution of 50 micron features is obtained. Automated load/unload is available, and side-to-side registration is achieved with cameras and registration target holes. Orbotech's Nuvogo DI System is designed for mass production of advanced HDI/flex and rigid-flex applications, according to Orbotech. The Nuvogo™ 800 is compatible with nearly all resist types. The MultiWave Laser Technology™ uses a multi wavelength laser beam of high in- tensity so that lower cost resist with standard photosensitivity can be used for high through- put (up to 7,000 panels/day/line) with optimal line structure. PCB kArl's TeCh TAlk DIGITAL IMAGInG reVISITeD Karl Dietz is president of Karl Dietz consulting llc. he offers consulting services and tutori- als in the field of circuit board & substrate fabrication technology. to view past columns or to reach Dietz, click here. Dietz may also be reached by phone at (001) 919-870-6230. " They all have in common the building of a pattern, pixel by pixel, and they employ digital on/off switches to form the pattern. "